Yu-Sen Jiang

My primary research focus lies in the realm of thin film growth, including its structure and properties. Specifically, I delve into the intricacies of atomic layer deposition (ALD), exploring various aspects such as precursor reactions, interface growth, epitaxy, and the effects induced by external energy sources. I'm currently a Postdoctoral Fellow at the Taiwan Science and Technology Hub, working within Professor Stacey Bent's group in the Department of Chemical Engineering. I am dedicated to unraveling the chemical reaction mechanisms in vapor-phase deposition processes and exploring their applications in energy and catalysis. My goal in this field is to understand the fundamental processes of material growth and utilize this knowledge to advance technology and innovation.